AXIAL DECAYING OF THE MICROWAVE ECR OXYGEN PLASMA

被引：2

作者：

BARDOS, L

MUSIL, J

机构：

[1] Czechoslovak Acad of Sciences, Czech Republic

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1988年 / 21卷 / 09期

关键词：

D O I：

10.1088/0022-3727/21/9/022

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1459 / 1461

页数：3

共 13 条

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BARDOS, L ;

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[3]

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[4]

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[7] PRESENT STATUS OF THIN OXIDE-FILMS CREATION IN A MICROWAVE PLASMA [J].

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[8] PLASMA OXIDATION OF SILICON IN A MICROWAVE-DISCHARGE AND ITS SPECIFICITY [J].

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[9] LOCALIZATION OF A HIGH-POWER MICROWAVES ABSORPTION IN CYLINDRICAL PLASMA COLUMN AT OMEGA-LH LESS-THAN OMEGA LESS-THAN OMEGA-CE [J].

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[10]

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