STRESS, MICROSTRUCTURE AND MATERIALS RELIABILITY OF SPUTTER-DEPOSITED FE-N FILMS

被引：13

作者：

NARAYAN, PB

KIM, YK

机构：

[1] Rocky Mountain Magnetics, Inc., Louisville

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1994年 / 30卷 / 06期

关键词：

Atmospheric humidity - Chemical analysis - Heat treatment - Magnetic properties - Materials testing - Metallic films - Metallographic microstructure - Nitrogen - Reliability - Residual stresses - Sputter deposition - X ray spectroscopy;

D O I：

10.1109/20.333944

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Sputtered Fe-N films with various nitrogen contents were investigated form the point of view of device manufacturing. As deposited Fe-N films have compressive stress that becomes tensile due to heat treatment. At the optimum N content where soft magnetic properties were realized, the film shows a close to amorphous microstructure. Compared to NiFe, Fe-N has higher reactivity with humidity and lower reactivity with atmospheric pollutants such as Cl and S.

引用

页码：3921 / 3923

页数：3

共 5 条

[1]

BRAR AS, 1993, MATERIALS PROCESSING

[2] MAGNETIC-PROPERTIES AND MICROSTRUCTURE OF FE4N AND (FE,NI)4N [J].