ELECTRICAL BREAKDOWN .2. DURING THE ANODIC GROWTH OF ALUMINUM-OXIDE

被引:28
作者
KLEIN, N
MOSKOVICI, V
KADARY, V
机构
关键词
D O I
10.1149/1.2129605
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:152 / 155
页数:4
相关论文
共 19 条
[1]   OPTICAL PROPERTIES OF ALUMINUM OXICE IN VACUUM ULTRAVIOLET [J].
ARAKAWA, ET ;
WILLIAMS, MW .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1968, 29 (05) :735-&
[2]   THE GROWTH OF BARRIER OXIDE FILMS ON ALUMINUM [J].
BERNARD, WJ ;
COOK, JW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1959, 106 (08) :643-646
[3]  
COLLINS RE, 1964, SOLID STATE ELECTRON, V1, P445
[4]   EFFECTS ON INTERFACE BARRIER ENERGIES OF METAL-ALUMINUM OXIDE-SEMICONDUCTOR (MAS) STRUCTURES AS A FUNCTION OF METAL ELECTRODE MATERIAL, CHARGE TRAPPING, AND ANNEALING [J].
DIMARIA, DJ .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (12) :5454-5456
[5]   HOT ELECTRON ENERGY LOSS IN TUNNEL CATHODE STRUCTURES [J].
HANDY, RM .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (13) :4620-&
[6]   HIGH RESISTANCE ANODIC OXIDE FILMS ON ALUMINIUM [J].
HARKNESS, AC ;
YOUNG, L .
CANADIAN JOURNAL OF CHEMISTRY, 1966, 44 (20) :2409-&
[7]   ELECTRICAL BREAKDOWN .1. DURING THE ANODIC GROWTH OF TANTALUM PENTOXIDE [J].
KADARY, V ;
KLEIN, N .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (01) :139-151
[8]   ELECTRON EMISSION FROM THIN AL-AL2O3-AU STRUCTURES [J].
KANTER, H ;
FEIBELMAN, WA .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (12) :3580-&
[9]   PHOTOELECTRIC CURRENTS IN THIN AL2O3 FILMS [J].
KLEEFSTRA, M ;
VANZANTEN, AT ;
CERIOLO, P .
THIN SOLID FILMS, 1975, 30 (02) :225-231
[10]   THEORY OF LOCALIZED ELECTRONIC BREAKDOWN IN INSULATING FILMS [J].
KLEIN, N .
ADVANCES IN PHYSICS, 1972, 21 (92) :605-+