ELECTRICAL BREAKDOWN .1. DURING THE ANODIC GROWTH OF TANTALUM PENTOXIDE

被引：60

作者：

KADARY, V ^{[1
]}

KLEIN, N ^{[1
]}

机构：

[1] TECHNION ISRAEL INST TECHNOL,FAC ELECT ENGN,HAIFA,ISRAEL

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 01期

关键词：

D O I：

10.1149/1.2129604

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：139 / 151

页数：13

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共 43 条

[1] SCINTILLATION IN ANODIC TA2O5 FILMS
ALBELLA, JM
MONTERO, I
MARTINEZDUART, JM
[J]. THIN SOLID FILMS, 1979, 58 (02) : 307 - 311
[2] INFLUENCE OF LAW OF ELECTRICAL CONDUCTIVITY ON THERMAL SWITCHING AND BREAKDOWN
ALTCHEH, L
KLEIN, N
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1973, ED20 (09) : 801 - 811
[3] PHOTOCONDUCTION IN ANODIC TA2O5
APKER, L
TAFT, EA
[J]. PHYSICAL REVIEW, 1952, 88 (01): : 58 - 59
[4] TRANSIENT CONDUCTION IN INSULATORS AT HIGH FIELDS
ARNETT, PC
[J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (12) : 5236 - 5243
[5] ASYMMETRIC CONDUCTION IN THIN FILM TANTALUM/TANTALUM OXIDE-METAL STRUCTURES - INTERSTITIAL AND SUBSTITUTIONAL IMPURITY EFFECTS AND DIRECT DETECTION OF FLAW BREAKDOWN
AXELROD, NN
SCHWARTZ, N
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (04) : 460 - &
[6] DIELECTRIC BREAKDOWN IN ELECTROLYTIC CAPACITORS
BURGER, FJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (12) : 2039 - &
[7] DELLOCA CJ, 1971, PHYS THIN FILMS, V6, P1, DOI DOI 10.1016/B978-0-12-533006-0.50008-6
[8] IMPACT IONIZATION MODEL FOR DIELECTRIC INSTABILITY AND BREAKDOWN
DISTEFANO, TH
SHATZKES, M
[J]. APPLIED PHYSICS LETTERS, 1974, 25 (12) : 685 - 687
[9] DIELECTRIC INSTABILITY AND BREAKDOWN IN SIO2 THIN-FILMS
DISTEFANO, TH
SHATZKES, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 50 - 54
[10] DIELECTRIC INSTABILITY AND BREAKDOWN IN WIDE BANDGAP INSULATORS
DISTEFANO, TH
SHATZKES, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 37 - 46

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