DETECTION OF ALUMINUM PARTICLES DURING THE CHEMICAL VAPOR-DEPOSITION OF ALUMINUM FILMS USING TERTIARYAMINE COMPLEXES OF ALANE (AIH3)

被引:39
作者
SIMMONDS, MG
GLADFELTER, WL
RAO, N
SZYMANSKI, WW
AHN, KH
MCMURRY, PH
机构
[1] UNIV MINNESOTA,DEPT MECH ENGN,MINNEAPOLIS,MN 55455
[2] UNIV MINNESOTA,PARTICLE TECHNOL LAB,MINNEAPOLIS,MN 55455
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 05期
关键词
D O I
10.1116/1.577534
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Two methods of analyzing particles were interfaced to a low pressure chemical vapor desposition (CVD) reactor to evaluate whether or not particles were formed in the gas phase during the growth of aluminum films using tertiaryamine complexes of alane. A laser light scattering particle counter was used to detect large (> 200 nm) particles in real time and established that the appearance of particles corresponded to the flow of precursor into the CVD reactor. A particle impaction system was used to collect particles (> 20 nm) for analysis using analytical electron microscopy and electron diffraction. This established that the particles were crystalline aluminum and that the particle sizes ranged from 20-700 nm. The median size was 85 nm.
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收藏
页码:2782 / 2784
页数:3
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