HYDROGEN EFFUSION UNDER 6-7-MEV N-15 IONS IRRADIATION IN OXYGEN-CONTAMINATED THIN-FILMS OF SPUTTERED A-SI-H

被引：9

作者：

FALLAVIER, M ^{[1
]}

THOMAS, JP ^{[1
]}

TOUSSET, J ^{[1
]}

MONTEIL, Y ^{[1
]}

BOUIX, J ^{[1
]}

机构：

[1] UNIV CLAUDE BERNARD LYON 1,PHYS CHIM LAB,F-69622 VILLEURBANNE,FRANCE

来源：

APPLIED PHYSICS LETTERS | 1981年 / 39卷 / 06期

关键词：

D O I：

10.1063/1.92770

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：490 / 492

页数：3

共 12 条

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