MODELING THE DC PERFORMANCE OF HETEROSTRUCTURE-EMITTER BIPOLAR-TRANSISTOR

被引:3
作者
LOUR, WS
LIU, WC
GUO, DF
LIU, RC
机构
[1] NATL CHENG KUNG UNIV,DEPT ELECT ENGN,TAINAN,TAIWAN
[2] CHUNG SHAN INST SCI & TECHNOL,LUNGTAN,TAIWAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 08期
关键词
HETEROSTRUCTURE-EMITTER BIPOLAR TRANSISTOR (HEBT); BAND-GAP SHRINKAGE; GUMMEL NUMBER; OFFSET VOLTAGE; MOLECULAR BEAM EPITAXY;
D O I
10.1143/JJAP.31.2388
中图分类号
O59 [应用物理学];
学科分类号
摘要
A theoretical model related to minority carrier properties was developed to study the DC performance of a heterostructure-emitter bipolar transistor (HEBT) which uses an AlGaAs/GaAs heterojunction only for minority carrier confinement and causes improved emitter electron injection efficiency. In this study, minority carrier properties were described by means of polynominal fit to the previous data. Here, the band-gap shrinkage in heavily doped layers was also taken into account. On the other hand, current gains of 55 and 180 were achieved experimentally for an HEBT with Al0.3Ga0.7As and Al0.5Ga0.5As confinement layers, respectively. It is found that the calculated data were agree with the experimental results. With the reduction of the base width to 0.1 mum, a common-emitter current gain of around 1000 with small offset voltage was confirmed. These results reveal that the HEBT exhibits the feature of simplicity and excellent DC performance.
引用
收藏
页码:2388 / 2393
页数:6
相关论文
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