共 16 条
[1]
MECHANISMS OF VOLTAGE-CONTROLLED, REACTIVE, PLANAR MAGNETRON SPUTTERING OF AL IN AR-N2 AND AR-O2 ATMOSPHERES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
1984, 2 (03)
:1275-1284
[2]
LASER SPECTROSCOPY OF SPUTTERED ATOMS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1986, 4 (03)
:1779-1785
[3]
PARTIAL-PRESSURE CONTROL OF REACTIVELY SPUTTERED TITANIUM NITRIDE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1985, 3 (03)
:592-595
[4]
A SPUTTERING WIND
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1985, 3 (03)
:561-566
[5]
THE FORMATION AND CONTROL OF DIRECT-CURRENT MAGNETRON DISCHARGES FOR THE HIGH-RATE REACTIVE PROCESSING OF THIN-FILMS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (03)
:1230-1234
[6]
PRACTICAL IN-LINE REACTIVE SPUTTERING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1987, 5 (04)
:2246-2252
[7]
A PHYSICAL MODEL FOR ELIMINATING INSTABILITIES IN REACTIVE SPUTTERING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1988, 6 (03)
:1832-1836
[8]
Maissel L.I., 1970, HDB THIN FILM TECHNO
[9]
DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1980, 17 (03)
:743-751