REACTIVE SPUTTER ETCHING SYSTEM WITH FLOATING GRID

被引：1

作者：

SHIBAYAMA, H

OGAWA, T

KOBAYASHI, K

HISATSUGU, T

机构：

来源：

关键词：

D O I：

10.7567/JJAPS.19S1.57

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：57 / 60

页数：4

共 9 条

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MILLER, WE ;

GROSS, C .

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[8]

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[9]

ZIELINSKI LB, 1976, 149TH EL SOC M, V76, P147