INVESTIGATION OF RF SPUTTER ETCHED SILICON SURFACES USING HELIUM ION BACKSCATTER

被引：27

作者：

SACHSE, GW ^{[1
]}

MILLER, WE ^{[1
]}

GROSS, C ^{[1
]}

机构：

[1] NASA,LANGLEY RES CTR,HAMPTON,VA 23665

来源：

SOLID-STATE ELECTRONICS | 1975年 / 18卷 / 05期

关键词：

D O I：

10.1016/0038-1101(75)90045-3

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：431 / 435

页数：5

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