ELECTRON-BEAM DAMAGE IN AUGER-ELECTRON SPECTROSCOPY

[1] ELECTRON-BEAM EFFECTS IN DEPTH PROFILING MEASUREMENTS WITH AUGER-ELECTRON SPECTROSCOPY [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (10) : 4581 - 4583

[2] LOCAL COMPOSITIONAL CHANGES IN ALKALI SILICATE GLASSES DURING ELECTRON MICROPROBE ANALYSIS [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (05) : 2406 - &

[3] APPLICATION OF ELECTRON-SPECTROSCOPY TO SURFACE STUDIES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 212 - 224

[4] SURFACE-STRUCTURES OF PHTHALOCYANINE MONOLAYERS AND VAPOR-GROWN FILMS - LOW-ENERGY ELECTRON-DIFFRACTION STUDY [J]. JOURNAL OF CHEMICAL PHYSICS, 1977, 66 (02) : 573 - 580

[5] EFFECTS OF ELECTRON-BOMBARDMENT DURING AUGER-ELECTRON ANALYSIS OF CORRODED METAL-SURFACES [J]. MATERIALS SCIENCE AND ENGINEERING, 1980, 42 (1-2): : 207 - 214

[6] STUDY OF CHARGING AND DISSOCIATION OF SIO2 SURFACES BY AES [J]. SURFACE SCIENCE, 1977, 64 (01) : 209 - 223

[7] SILICON-ON-SAPPHIRE EPITAXY BY VACUUM SUBLIMATION - LEED-AUGER STUDIES AND ELECTRONIC PROPERTIES OF FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (03): : 500 - &

[8] CHANG CC, 1974, CHARACTERIZATION SOL, P550

[9] CHAPPELL RA, 1974, PHYS CHEM GLASSES, V15, P130

[10] AUGER ANALYSIS OF CHLORINE IN HCL-GROWN, OR CL2-GROWN SIO2 FILMS [J]. APPLIED PHYSICS LETTERS, 1973, 22 (08) : 380 - 381

[1] ELECTRON-BEAM EFFECTS IN DEPTH PROFILING MEASUREMENTS WITH AUGER-ELECTRON SPECTROSCOPY [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (10) : 4581 - 4583

[2] LOCAL COMPOSITIONAL CHANGES IN ALKALI SILICATE GLASSES DURING ELECTRON MICROPROBE ANALYSIS [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (05) : 2406 - &

[3] APPLICATION OF ELECTRON-SPECTROSCOPY TO SURFACE STUDIES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 212 - 224

[4] SURFACE-STRUCTURES OF PHTHALOCYANINE MONOLAYERS AND VAPOR-GROWN FILMS - LOW-ENERGY ELECTRON-DIFFRACTION STUDY [J]. JOURNAL OF CHEMICAL PHYSICS, 1977, 66 (02) : 573 - 580

[5] EFFECTS OF ELECTRON-BOMBARDMENT DURING AUGER-ELECTRON ANALYSIS OF CORRODED METAL-SURFACES [J]. MATERIALS SCIENCE AND ENGINEERING, 1980, 42 (1-2): : 207 - 214

[6] STUDY OF CHARGING AND DISSOCIATION OF SIO2 SURFACES BY AES [J]. SURFACE SCIENCE, 1977, 64 (01) : 209 - 223

[7] SILICON-ON-SAPPHIRE EPITAXY BY VACUUM SUBLIMATION - LEED-AUGER STUDIES AND ELECTRONIC PROPERTIES OF FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (03): : 500 - &

[8] CHANG CC, 1974, CHARACTERIZATION SOL, P550

[9] CHAPPELL RA, 1974, PHYS CHEM GLASSES, V15, P130

[10] AUGER ANALYSIS OF CHLORINE IN HCL-GROWN, OR CL2-GROWN SIO2 FILMS [J]. APPLIED PHYSICS LETTERS, 1973, 22 (08) : 380 - 381