ANODIC OXIDES OF TA-AL ALLOY FILMS

被引：8

作者：

MUTH, DG

SITARIK, JP

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 12期

关键词：

Al alloy films - Al-concentration - Alloy compositions - Anodic oxides - Anodization voltages - Cosputtering - Field strengths - Oxide properties;

D O I：

10.1063/1.1659878

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The anodic oxides formed on two Ta alloy films with 23 at. % Al and 45 at. % Al are compared with anodic Ta//2O//5. The alloy films were obtained by cosputtering Ta and Al. A number of the oxide properties investigated depend on the Al concentration. For the anodization conditions and the electrolyte used in this study, the refractive index, dielectric constant, and differential field strength are independent of anodization voltage, and the stoichiometry of the two alloy compositions studied is maintained in the oxides.

引用

页码：4941 / &

共 9 条

[1]

BARRETT MA, 1962, 256 NATL BUR STD PUB, P215

[2]

Drude P., 1890, PHYS CHEM, V39, P481, DOI [10.1002/andp.18902750402, DOI 10.1002/ANDP.18902750402]

[3] MEASUREMEMT OF THICKNESS AND REFRACTIVE INDEX OF VERY THIN FILMS AND OPTICAL PROPERTIES OF SURFACES BY ELLIPSOMETRY [J].

MCCRACKIN, FL ;

PASSAGLIA, E ;

STROMBERG, RR ;

STEINBERG, HL .

JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS SECTION A-PHYSICS AND CHEMISTRY, 1963, A 67 (04) :363-+

[4]

MILLS D, 1966, J APPL PHYS, V7, P1821

[5] ELLIPSOMETER STUDY OF ANODIC OXIDES FORMED ON SPUTTERED TANTALUM AND TANTALUM-ALUMINUM ALLOY FILMS [J].

MUTH, DG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04) :749-&

[6] OPTICAL PROPERTIES OF SURFACE FILMS [J].

ROTHEN, A .

ANNALS OF THE NEW YORK ACADEMY OF SCIENCES, 1951, 53 (05) :1054-1063

[7] ELECTRICAL AND STRUCTURAL PROPERTIES OF CO-SPUTTERED TANTALUM-ALUMINUM FILMS [J].

STEIDEL, CA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04) :694-&

[8]

STEIDEL CA, 1969 P EL COMP C WAS, P372

[9]

Young L, 1961, ANODIC OXIDE FILMS

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