INSITU OBSERVATIONS OF DC AND AC ELECTROMIGRATION IN PASSIVATED AL LINES

被引：27

作者：

CASTANO, E

MAIZ, J

FLINN, P

MADDEN, M

机构：

[1] INTEL CORP,HILLSBORO,OR 97123

[2] INTEL CORP,SANTA CLARA,CA 95051

来源：

APPLIED PHYSICS LETTERS | 1991年 / 59卷 / 01期

关键词：

D O I：

10.1063/1.105551

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In situ experiments have been carried out using a field emission scanning electron microscope (Hitachi S-800) in order to characterize the dynamic behavior of electromigration (EM) voids under high spatial resolution. These experiments have shown how the EM voids move against the electron wind either in passivated or unpassivated lines under dc and low-frequency ac currents.

引用

页码：129 / 131

页数：3

共 6 条

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[6] Thomas R. W., 1983, 21st Annual Proceedings on Reliability Physics 1983, P1, DOI 10.1109/IRPS.1983.361954

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