REACTIVE ION ETCHING OF BISRCACUO SUPERCONDUCTING THIN-FILMS USING ETHANE AND OXYGEN

被引：2

作者：

OISHI, T ^{[1
]}

TAKAMI, T ^{[1
]}

KURODA, K ^{[1
]}

KOJIMA, K ^{[1
]}

WADA, O ^{[1
]}

NUNOSHITA, M ^{[1
]}

机构：

[1] MITSUBISHI ELECTR CORP,MAT & ELECTR DEVICE LAB,AMAGASAKI,HYOGO 661,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 3A期

关键词：

BISRCACUO; SUPERCONDUCTING THIN FILM; REACTIVE ION ETCHING; ETHANE; OXYGEN;

D O I：

10.1143/JJAP.33.L315

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Reactive ion etching (RIE) of Bi2Sr2Ca2Cu3Ox superconducting thin films was performed using ethane and oxygen. As for the etched surface morphology, no degradation was observed as compared with that before etching. The zero resistivity temperature for the samples etched by RIE was the same as that of the as-grown sample. Another feature of this etching was a maximum selectivity of 50 against MgO substrates.

引用

页码：L315 / L317

页数：3

共 8 条

[1] DRY-ETCHING PROCESSES FOR HIGH-TEMPERATURE SUPERCONDUCTORS [J].

ALFF, L ;

FISCHER, GM ;

GROSS, R ;

KOBER, F ;

BECK, A ;

HUSEMANN, KD ;

NISSEL, T ;

SCHMIDL, F ;

BURCKHARDT, C .

PHYSICA C, 1992, 200 (3-4) :277-286

[2] PREPARATION, PATTERNING, AND PROPERTIES OF THIN YBA2CU3O7-DELTA FILMS [J].

DEVRIES, JWC ;

DAM, B ;

HEIJMAN, MGJ ;

STOLLMAN, GM ;

GIJS, MAM ;

HAGEN, CW ;

GRIESSEN, RP .

APPLIED PHYSICS LETTERS, 1988, 52 (22) :1904-1906

[3] EFFECTS OF AR ION-BEAM ETCHING ON GD-BA-CU-O SUPERCONDUCTING THIN-FILMS [J].

ENOKIHARA, A ;

HIGASHINO, H ;

KOHIKI, S ;

SETSUNE, K ;

WASA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (03) :L452-L455

[4] SURFACE-MORPHOLOGY AND CRYSTAL-STRUCTURES OF AS-GROWN BISRCACUO THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING FROM 3 TARGETS [J].

KURODA, K ;

KOJIMA, K ;

TANIOKU, M ;

YOKOYAMA, K ;

HAMANAKA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (09) :1586-1592

[5] REACTIVE ION-BEAM ETCHING OF Y-BA-CU-O SUPERCONDUCTORS [J].

MATSUI, S ;

TAKADO, N ;

TSUGE, H ;

ASAKAWA, K .

APPLIED PHYSICS LETTERS, 1988, 52 (01) :69-71

[6] EFFECT OF ETHANE ADDITION TO ARGON IN ETCHING OF BISRCACUO SUPERCONDUCTING THIN-FILMS [J].

OISHI, T ;

TAKAMI, T ;

KOJIMA, K ;

KURODA, K ;

WADA, O .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1993, 32 (2A) :L187-L189

[7] LIQUID-NITROGEN-COOLED DRY ETCHING OF YBACUO THIN-FILMS [J].

SATO, H ;

AKOH, H ;

NISHIHARA, K ;

AOYAGI, M ;

TAKADA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1992, 31 (8A) :L1044-L1046

[8]

Wolf S., 1986, SILICON PROCESSING V, V1, P539

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