RAPID FORMATION OF TIO2 FILMS BY A CONVENTIONAL CVD METHOD

被引：32

作者：

KAMATA, K

MARUYAMA, K

AMANO, S

FUKAZAWA, H

机构：

[1] Department of Chemistry, Nagaoka University of Technology, Nagaoka, Niigata

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1990年 / 9卷 / 03期

关键词：

D O I：

10.1007/BF00725836

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：316 / 319

页数：4

共 16 条

[1]

Fujishima A, 1969, J CHEM SOC JAPAN, V72, P108

[2] GROWTH CHARACTERISTICS OF RUTILE FILM BY CHEMICAL VAPOR DEPOSITION [J].

GHOSHTAGORE, RN ;

NOREIKA, AJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (10) :1310-+

[3] MECHANISM OF HETEROGENEOUS DEPOSITION OF THIN FILM RUTILE [J].

GHOSHTAGORE, RN .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) :529-+

[4]

HAGGERTY JS, 1984, ULTRASTRUCTURE PROCE, P360

[5] CHEMICAL VAPOR-DEPOSITION OF RUTILE FILMS [J].

HAYASHI, S ;

HIRAI, T .

JOURNAL OF CRYSTAL GROWTH, 1976, 36 (01) :157-164

[6]

Kamata K., 1986, Yogyo-Kyokai-Shi, V94, P910, DOI 10.2109/jcersj1950.94.1092_910

[7] ZNO POWDERS PREPARED BY THE VAPOR-PHASE REACTION USING ZINC ACETYLACETONATE COMPLEX AND WATER-VAPOR [J].

KAMATA, K ;

MATSUMOTO, S ;

OTSUKA, N .

NIPPON KAGAKU KAISHI, 1983, (12) :1715-1719

[8]

KAMATA K, 1985, J AM CERAM SOC, V68, pC193, DOI 10.1111/j.1151-2916.1985.tb10179.x

[9] MGO FILMS DEPOSITED BY CHEMICAL VAPOR-DEPOSITION [J].

KAMATA, K ;

SHIBATA, Y ;

KISHI, Y .

JOURNAL OF MATERIALS SCIENCE LETTERS, 1984, 3 (05) :423-426

[10]

Kamata K., 1981, Yogyo-Kyokai-Shi, V89, P337, DOI 10.2109/jcersj1950.89.1030_337

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