CONTROLLED MODIFICATION OF HETEROJUNCTION BAND LINEUPS BY DIFFUSIVE INTRALAYERS

被引:16
作者
MCKINLEY, JT
HWU, Y
RIOUX, D
TERRASI, A
ZANINI, F
MARGARITONDO, G
DEBSKA, U
FURDYNA, JK
机构
[1] UNIV WISCONSIN,CTR SYNCHRTRON RADIAT,MADISON,WI 53706
[2] UNIV NOTRE DAME,DEPT PHYS,NOTRE DAME,IN 46556
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 03期
关键词
D O I
10.1116/1.576826
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We explore the effects of ultrathin Au intralayers at the interfaces of the lattice-matched heterojunctions ZnSe-Ge and GaP-SL and compare them to earlier results with A1 intralayers. Au intralayers do not chemically react with the semiconductors and diffuse strongly into both sides of the junction, whereas Al intralayers react and remain localized to the interface. Not only do the intralayer metals diffuse differently, but they cause the semiconductor components to interdiffuse differently. Comparison gives insight concerning interface-localized effects on the valence band discontinuity. © 1990, American Vacuum Society. All rights reserved.
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页码:1917 / 1921
页数:5
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