AUO+ AND AUO+2 GASEOUS-IONS FORMED DURING THE SPUTTER DEPOSITION OF AU FILMS IN AR-O2 DISCHARGES

被引：17

作者：

AITA, CR ^{[1
]}

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53706

来源：

关键词：

D O I：

10.1063/1.338295

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5182 / 5184

页数：3

共 14 条

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