REACTIVE ION ETCH CHARACTERISTICS OF THIN INGAAS AND ALGAAS STOP-ETCH LAYERS

被引：10

作者：

COOPER, CB

SALIMIAN, S

MACMILLAN, HF

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1989年 / 18卷 / 05期

关键词：

D O I：

10.1007/BF02657476

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：619 / 622

页数：4

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