SELECTIVE DRY ETCHING OF GAAS OVER ALGAAS IN SF6/SICL4 MIXTURES

[1] Allem K. P., 1986, J ELECTROCHEM SOC, V133, P2325

[2] SELECTIVE DRY ETCHING OF ALGAAS-GAAS HETEROJUNCTION [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (11) : L847 - L850

[3] Holliday AK, 1973, COMPREHENSIVE INORGA

[4] HU EL, 1987, P SPIE ADV PROCESSIN, V797

[5] SELECTIVE GAAS/ALXGA1-X AS REACTIVE ION ETCHING USING CCL2F2 [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (05): : 1233 - 1236

[6] Kubaschewski O., 1979, METALLURGICAL THERMO

[7] ORIENTATION DEPENDENT REACTIVE ION ETCHING OF GAAS IN SICL4 [J]. APPLIED PHYSICS LETTERS, 1984, 45 (08) : 897 - 899

[8] DRY ETCHING OF VIA CONNECTIONS FOR GAAS MONOLITHIC MICROWAVE INTEGRATED-CIRCUITS FABRICATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06): : 1606 - 1610

[9] REACTIVE ION ETCH PROCESS WITH HIGHLY CONTROLLABLE GAAS-TO-ALGAAS SELECTIVITY USING SF6 AND SICL4 [J]. APPLIED PHYSICS LETTERS, 1987, 51 (14) : 1083 - 1085

[10] AN ANALYTICAL STUDY OF ETCH AND ETCH-STOP REACTIONS FOR GAAS ON ALGAAS IN CCL2F2 PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (06) : 2358 - 2364

[1] Allem K. P., 1986, J ELECTROCHEM SOC, V133, P2325

[2] SELECTIVE DRY ETCHING OF ALGAAS-GAAS HETEROJUNCTION [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (11) : L847 - L850

[3] Holliday AK, 1973, COMPREHENSIVE INORGA

[4] HU EL, 1987, P SPIE ADV PROCESSIN, V797

[5] SELECTIVE GAAS/ALXGA1-X AS REACTIVE ION ETCHING USING CCL2F2 [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (05): : 1233 - 1236

[6] Kubaschewski O., 1979, METALLURGICAL THERMO

[7] ORIENTATION DEPENDENT REACTIVE ION ETCHING OF GAAS IN SICL4 [J]. APPLIED PHYSICS LETTERS, 1984, 45 (08) : 897 - 899

[8] DRY ETCHING OF VIA CONNECTIONS FOR GAAS MONOLITHIC MICROWAVE INTEGRATED-CIRCUITS FABRICATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06): : 1606 - 1610

[9] REACTIVE ION ETCH PROCESS WITH HIGHLY CONTROLLABLE GAAS-TO-ALGAAS SELECTIVITY USING SF6 AND SICL4 [J]. APPLIED PHYSICS LETTERS, 1987, 51 (14) : 1083 - 1085

[10] AN ANALYTICAL STUDY OF ETCH AND ETCH-STOP REACTIONS FOR GAAS ON ALGAAS IN CCL2F2 PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (06) : 2358 - 2364