GAMMA-X INTERVALLEY TUNNELING IN INAS/ALSB RESONANT TUNNELING DIODES

被引:12
作者
CARNAHAN, RE
MALDONADO, MA
MARTIN, KP
NOGARET, A
HIGGINS, RJ
CURY, LA
MAUDE, DK
PORTAL, JC
CHEN, JF
CHO, AY
机构
[1] GEORGIA INST TECHNOL,MICROELECTR RES CTR,ATLANTA,GA 30332
[2] INSA,DEPT GENIE PHYS,F-31077 TOULOUSE,FRANCE
[3] CNRS,SNCI,F-38042 GRENOBLE,FRANCE
[4] AT&T BELL LABS,MURRAY HILL,NJ 07974
关键词
D O I
10.1063/1.108687
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present an experimental study of intravalley and intervalley transport in an InAs/AlSb/InAs/AlSb/InAs double barrier resonant tunneling diode at liquid helium temperatures. This work reports the first observation of intervalley tunneling through an InAs GAMMA-point quasibound state confined by AlSb X-point barriers. The incident energy of tunneling electrons was tuned by a transverse magnetic field (0 < B < 17 T). Self-consistent calculations of the current-voltage relation and a model that includes a transverse wave vector contribution to the magnetic field behavior of the resonances are used to describe the experimental results. From this, we determine that the device current is composed of GAMMA-point InAs electrons tunneling through X-point AlSb barriers (with large longitudinal effective mass) as well as GAMMA-point AlSb barriers.
引用
收藏
页码:1385 / 1387
页数:3
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