25 NM FEATURES PATTERNED WITH TRILEVEL E-BEAM RESIST

被引：23

作者：

TENNANT, DM ^{[1
]}

JACKEL, LD ^{[1
]}

HOWARD, RE ^{[1
]}

HU, EL ^{[1
]}

GRABBE, P ^{[1
]}

CAPIK, RJ ^{[1
]}

SCHNEIDER, BS ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571265

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1304 / 1307

页数：4

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HATZAKIS, M
SPILLER, E
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (01) : 154 - 161
[2] NEW HYBRID (E-BEAM-X-RAY) EXPOSURE TECHNIQUE FOR HIGH ASPECT RATIO MICROSTRUCTURE FABRICATION
HATZAKIS, M
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1631 - 1634
[3] 400-A LINEWIDTH E-BEAM LITHOGRAPHY ON THICK SILICON SUBSTRATES
HOWARD, RE
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GRABBE, P
TENNANT, DM
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (07) : 592 - 594
[4] 50-NM SILICON STRUCTURES FABRICATED WITH TRILEVEL ELECTRON-BEAM RESIST AND REACTIVE-ION ETCHING
JACKEL, LD
HOWARD, RE
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TENNANT, DM
GRABBE, P
[J]. APPLIED PHYSICS LETTERS, 1981, 39 (03) : 268 - 270
[5] HYBRID E-BEAM-DEEP-UV EXPOSURE USING PORTABLE CONFORMABLE MASKING (PCM) TECHNIQUE
LIN, BJ
CHANG, THP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1669 - 1671
[6] HIGH-RESOLUTION, STEEP PROFILE RESIST PATTERNS
MORAN, JM
MAYDAN, D
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1620 - 1624