SI DEPOSITION BY ELECTRON-BEAM INDUCED SURFACE-REACTION

被引：13

作者：

MATSUI, S

MITO, M

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 16期

关键词：

D O I：

10.1063/1.100465

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1492 / 1494

页数：3

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