GLASS SUBSTRATE CHEMICAL-ANALYSIS USING ELECTRON-INDUCED X-RAY-EMISSION IN SPUTTER DEPOSITION

被引：2

作者：

HECQ, M

机构：

来源：

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY | 1989年 / 44卷 / 04期

关键词：

D O I：

10.1016/0584-8547(89)80045-X

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

引用

页码：419 / 425

页数：7

共 11 条

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[6] SPECTROMETRY OF X-RAY-INDUCED EMISSION IN SPUTTERING DEPOSITION - A NEW TECHNIQUE FOR INSITU THIN-FILM CHEMICAL-ANALYSIS [J].

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[7] QUANTITATIVE-DETERMINATION OF OXYGEN IN THIN OXIDE-FILMS ON METALS BY ELECTRON-EXCITED X-RAY-EMISSION [J].

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[8] GENERAL-MODEL OF SODIUM DESORPTION AND DIFFUSION DURING ELECTRON-BOMBARDMENT OF GLASS [J].

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