MECHANISMS IN ION-INDUCED C-BN GROWTH

A literature survey on ion beam assisted deposition of boron nitride shows well defined ranges (domains) of microscopic parameters in which different phases of boron nitride occur. These are interpreted in terms of a growth model in which temperature dependent desorption of incoming material and selective sputtering of h-BN play dominating roles. This concept is transferred to chemical vapour deposition in which microscopic parameters cannot be quantified well. For this case a simple rule is developed which also shows the influence of sputtering during deposition. c-BN is compared with diamond-like carbon with respect to dominating deposition mechanisms.