LOW-ENERGY ELECTRON-DIFFRACTION AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF THE FORMATION OF SUBMONOLAYER INTERFACES OF SB/SI(111)

被引：92

作者：

PARK, CY ^{[1
]}

ABUKAWA, T ^{[1
]}

KINOSHITA, T ^{[1
]}

ENTA, Y ^{[1
]}

KONO, S ^{[1
]}

机构：

[1] TOHOKU UNIV,FAC SCI,DEPT PHYS,SENDAI,MIYAGI 980,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 01期

关键词：

D O I：

10.1143/JJAP.27.147

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：147 / 148

页数：2

共 5 条

[1] THE INTERACTION OF SB4 MOLECULAR-BEAMS WITH SI(100) SURFACES - MODULATED-BEAM MASS-SPECTROMETRY AND THERMALLY STIMULATED DESORPTION STUDIES
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[J]. SURFACE SCIENCE, 1986, 165 (2-3) : 303 - 326
[2] ANTIMONY ADSORPTION ON SILICON
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[J]. SURFACE SCIENCE, 1984, 137 (2-3) : 397 - 411
[3] ANALYSIS OF THE ATOMIC-STRUCTURE OF THE SI(111) SQUARE-ROOT-3 X SQUARE-ROOT-3-BI - SURFACE BY X-RAY PHOTOELECTRON DIFFRACTION
PARK, CY
ABUKAWA, T
HIGASHIYAMA, K
KONO, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (08): : L1335 - L1337
[4] KINETICS OF ANTIMONY DOPING IN SILICON MOLECULAR-BEAM EPITAXY
TABE, M
KAJIYAMA, K
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (03): : 423 - 428
[5] EFFECT OF VALENCY IN METAL ADSORPTION ON SI(111) - THE CASE OF SB ON THE CLEAVED SURFACE
TALEBIBRAHIMI, A
SEBENNE, CA
[J]. SURFACE SCIENCE, 1986, 168 (1-3) : 114 - 121