VACUUM ULTRAVIOLET PHOTOCHEMISTRY IN THIN RESIST FILMS

被引：11

作者：

BOHN, PW

TAYLOR, JW

GUCKEL, H

机构：

[1] UNIV WISCONSIN,DEPT CHEM,MADISON,WI 53706

[2] UNIV WISCONSIN,DEPT ELECT & COMP ENGN,MADISON,WI 53706

来源：

ANALYTICAL CHEMISTRY | 1981年 / 53卷 / 07期

关键词：

D O I：

10.1021/ac00230a036

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：1082 / 1087

页数：6

共 35 条

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