HIGH-REPETITION-RATE TRANSVERSE-FLOW XEF LASER

被引:12
作者
WANG, CP
机构
关键词
D O I
10.1063/1.90059
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:360 / 362
页数:3
相关论文
共 18 条
[1]   HIGH-POWER XENON FLUORIDE LASER [J].
AULT, ER ;
BRADFORD, RS ;
BHAUMIK, ML .
APPLIED PHYSICS LETTERS, 1975, 27 (07) :413-415
[2]   HIGH-EFFICIENCY KRF EXCIMER LASER [J].
BHAUMIK, ML ;
BRADFORD, RS ;
AULT, ER .
APPLIED PHYSICS LETTERS, 1976, 28 (01) :23-24
[3]   354-NM LASER ACTION ON XEF [J].
BRAU, CA ;
EWING, JJ .
APPLIED PHYSICS LETTERS, 1975, 27 (08) :435-437
[4]   XENON FLUORIDE LASER EXCITATION BY TRANSVERSE ELECTRIC-DISCHARGE [J].
BURNHAM, R ;
HARRIS, NW ;
DJEU, N .
APPLIED PHYSICS LETTERS, 1976, 28 (02) :86-87
[5]   ULTRAVIOLET-PREIONIZED DISCHARGE-PUMPED LASERS IN XEF, KRF, AND ARF [J].
BURNHAM, R ;
DJEU, N .
APPLIED PHYSICS LETTERS, 1976, 29 (11) :707-709
[6]   HIGH-REPETITION-RATE XEF LASER WITH GAS RECYCLING [J].
CHRISTENSEN, CP .
APPLIED PHYSICS LETTERS, 1977, 30 (09) :483-484
[7]   LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL [J].
EWING, JJ ;
BRAU, CA .
APPLIED PHYSICS LETTERS, 1975, 27 (06) :350-352
[8]   SUPERRADIATIVE RARE-GAS HALIDE LASERS EXCITED BY ELECTRIC-DISCHARGE [J].
ISHCHENKO, VN ;
LISITSYN, VN ;
RAZHEV, AM .
APPLIED PHYSICS, 1977, 12 (01) :55-58
[9]  
LIEPMANN HW, 1960, ELEMENTS GASDYNAMICS, pCH2
[10]   ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF KRF LASER [J].
MANGANO, JA ;
JACOB, JH .
APPLIED PHYSICS LETTERS, 1975, 27 (09) :495-498