SCANNING ION-BEAM TECHNIQUES FOR THE EXAMINATION OF MICROELECTRONIC DEVICES

[1] Andersen H. H., 1981, Sputtering by particle bombardment I. Physical sputtering of single-element solids, P145

[2] CLEAVER JRA, 1983, MICROCIRCUIT ENG 83, P135

[3] REGISTRATION MARK DETECTION FOR SCANNING ION-BEAM LITHOGRAPHY [J]. ELECTRONICS LETTERS, 1985, 21 (14) : 629 - 630

[4] APPLICATION OF A FOCUSED ION-BEAM SYSTEM TO DEFECT REPAIR OF VLSI MASKS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 87 - 90

[5] OBSERVATION OF VOLTAGE CONTRAST IN SCANNING ION MICROSCOPY OF INTEGRATED-CIRCUITS [J]. ELECTRONICS LETTERS, 1987, 23 (11) : 585 - 586

[6] KIRK ECG, 1987, I PHYS C SER, V87, P691

[7] ION CHANNELING EFFECTS IN SCANNING ION MICROSCOPY WITH A 60 KEV GA+ PROBE [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 205 (1-2): : 299 - 309

[8] LISCHKE B, 1983, MICROCIRCUIT ENG 83, P465

[9] Oatley C.W., 1957, J ELECTRON CONTR, V2, P568

[10] SMITH B, 1977, ION IMPLANTATION RAN

[1] Andersen H. H., 1981, Sputtering by particle bombardment I. Physical sputtering of single-element solids, P145

[2] CLEAVER JRA, 1983, MICROCIRCUIT ENG 83, P135

[3] REGISTRATION MARK DETECTION FOR SCANNING ION-BEAM LITHOGRAPHY [J]. ELECTRONICS LETTERS, 1985, 21 (14) : 629 - 630

[4] APPLICATION OF A FOCUSED ION-BEAM SYSTEM TO DEFECT REPAIR OF VLSI MASKS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 87 - 90

[5] OBSERVATION OF VOLTAGE CONTRAST IN SCANNING ION MICROSCOPY OF INTEGRATED-CIRCUITS [J]. ELECTRONICS LETTERS, 1987, 23 (11) : 585 - 586

[6] KIRK ECG, 1987, I PHYS C SER, V87, P691

[7] ION CHANNELING EFFECTS IN SCANNING ION MICROSCOPY WITH A 60 KEV GA+ PROBE [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 205 (1-2): : 299 - 309

[8] LISCHKE B, 1983, MICROCIRCUIT ENG 83, P465

[9] Oatley C.W., 1957, J ELECTRON CONTR, V2, P568

[10] SMITH B, 1977, ION IMPLANTATION RAN