ELECTROMIGRATION IN CONDUCTOR STRIPES UNDER PULSED DC POWERING

[1] BALUFFI RW, 1968, PHYS STATUS SOLIDI, V25, P163

[2] ELECTROMIGRATION AND FAILURE IN ELECTRONICS - INTRODUCTION [J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (10): : 1409 - &

[3] TIME-DEPENDENT VOID NUCLEATION DURING ELECTROMIGRATION [J]. MATERIALS SCIENCE AND ENGINEERING, 1971, 7 (03): : 158 - &

[4] VOID FORMATION AND GROWTH DURING ELECTROMIGRATION IN THIN FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (13) : 5671 - &

[1] BALUFFI RW, 1968, PHYS STATUS SOLIDI, V25, P163

[2] ELECTROMIGRATION AND FAILURE IN ELECTRONICS - INTRODUCTION [J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (10): : 1409 - &

[3] TIME-DEPENDENT VOID NUCLEATION DURING ELECTROMIGRATION [J]. MATERIALS SCIENCE AND ENGINEERING, 1971, 7 (03): : 158 - &

[4] VOID FORMATION AND GROWTH DURING ELECTROMIGRATION IN THIN FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (13) : 5671 - &