共 7 条
[1]
LOW-STRESS TANTALUM ABSORBERS DEPOSITED BY SPUTTERING FOR X-RAY MASKS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1989, 7 (06)
:1680-1683
[2]
STABLE LOW-STRESS TUNGSTEN ABSORBER TECHNOLOGY FOR SUB-HALF-MICRON X-RAY-LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1991, 9 (06)
:3301-3305
[3]
TA FILM PROPERTIES FOR X-RAY MASK ABSORBERS
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS,
1990, 29 (11)
:2616-2619
[4]
X-RAY MASK DISTORTION ANALYSIS USING THE BOUNDARY ELEMENT METHOD
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1990, 8 (03)
:446-451
[6]
INTERNAL-STRESSES IN TITANIUM, NICKEL, MOLYBDENUM, AND TANTALUM FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1977, 14 (01)
:164-168
[7]
INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1974, 11 (04)
:666-670