X-RAY MASK DISTORTION ANALYSIS USING THE BOUNDARY ELEMENT METHOD

被引：10

作者：

OHKI, S

YOSHIHARA, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 03期

关键词：

D O I：

10.1116/1.585042

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：446 / 451

页数：6

共 13 条

[1]

Brebbia C.A., 1984, BOUNDARY ELEMENT TEC

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[4]

ISHIHARA S, 1988, 1 MICR PROC C TOK, P72

[5] REDUCTION IN X-RAY MASK DISTORTION USING AMORPHOUS WN-CHI ABSORBER STRESS COMPENSATED WITH ION-BOMBARDMENT [J].

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ITOH, J .

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[6] EFFECTS OF STRESS ON THE STABILITY OF X-RAY MASKS [J].

KARNEZOS, M .

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[7] INFLUENCE OF ABSORBER STRESS ON THE PRECISION OF X-RAY MASKS [J].

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[8] TA/SIN-STRUCTURE X-RAY MASKS FOR SUB-HALF-MICRON LSIS [J].

OHKI, S ;

KAKUCHI, M ;

MATSUDA, T ;

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ODA, M ;

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[9]

OHKI S, 1987, 34TH JSAP RS, P400

[10]

SEKIMOTO M, 1984, 16TH INT C SOL STAT, P23

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