共 14 条
[1]
Asakawa H., 1982, 1982 Symposium on VLSI Technology. Digest of Papers, P88
[3]
VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1981, 19 (04)
:941-945
[5]
A STEP-AND-REPEAT X-RAY-EXPOSURE SYSTEM FOR 0.5-MU-PATTERN REPLICATION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1985, 3 (06)
:1581-1586
[7]
X-RAY MASK HEATING DURING ELECTRON-BEAM PATTERNING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1987, 5 (01)
:278-282
[9]
INFLUENCE OF ABSORBER STRESS ON THE PRECISION OF X-RAY MASKS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1986, 4 (01)
:230-234
[10]
A PLASMA X-RAY SOURCE FOR X-RAY-LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1986, 4 (01)
:243-247