A PLASMA X-RAY SOURCE FOR X-RAY-LITHOGRAPHY

被引：41

作者：

OKADA, I

SAITOH, Y

ITABASHI, S

YOSHIHARA, H

机构：

[1] NTT, Atsugi, Jpn, NTT, Atsugi, Jpn

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583449

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

X-RAY AND GAMMA RAY PRODUCTION

引用

页码：243 / 247

页数：5

共 12 条

[1] Asakawa H., 1982, 1982 Symposium on VLSI Technology. Digest of Papers, P88
[2] X-RAY-SPECTRA FROM A GAS-PUFF Z-PINCH DEVICE
BURKHALTER, PG
SHILOH, J
FISHER, A
COWAN, RD
[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (07) : 4532 - 4540
[3] PROSPECTS FOR HIGH-BRIGHTNESS X-RAY SOURCES FOR LITHOGRAPHY
ECONOMOU, NP
FLANDERS, DC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 868 - 871
[4] FAST VALVE FOR GAS INJECTION INTO VACUUM
FISHER, A
MAKO, F
SHILOH, J
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (06) : 872 - 873
[5] HAYASAKA T, 1982, 10TH P EL SOC INT C, P265
[6] FAST IONIZATION GAUGE STUDIES OF QUASISTEADY GAS INJECTION INTO VACUUM
INUTAKE, M
KURIKI, K
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1972, 43 (11) : 1670 - &
[7] MATTHEWS SM, 1982, P SOC PHOTO-OPT INST, V333, P136, DOI 10.1117/12.933425
[8] NAGEL DJ, 1984, VLSI ELECTRON, V8, P132
[9] X-RAY-LITHOGRAPHY USING A PULSED PLASMA SOURCE
PEARLMAN, JS
RIORDAN, JC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1190 - 1193
[10] SUB-MICRON PATTERN REPLICATION USING A HIGH CONTRAST MASK AND 2-LAYER RESIST IN X-RAY-LITHOGRAPHY
SAITOH, Y
YOSHIHARA, H
WATANABE, I
NAKAYAMA, S
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (01): : 63 - 67