THE IMPROVEMENT OF THE ATMOSPHERIC-PRESSURE GLOW PLASMA METHOD AND THE DEPOSITION OF ORGANIC FILMS

被引：127

作者：

YOKOYAMA, T

KOGOMA, M

KANAZAWA, S

MORIWAKI, T

OKAZAKI, S

机构：

[1] Fac. of Sci. and Technol., Sophia Univ., Chiyoda-ku, Tokyo, 102

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1990年 / 23卷 / 03期

关键词：

D O I：

10.1088/0022-3727/23/3/021

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Recently the authors developed an atmospheric-pressure glow discharge plasma method which can be applied to surface treatment and deposition on insulating surfaces for purposes of large-scale system treatment. However, this method was not able to treat metallic substrates. Consequently, they have improved the upper electrode to enable metal substrates to be treated. Some organic films were polymerised by the atmospheric-pressure method. Comparison of results from the atmospheric-pressure glow plasma method with those obtained by the low-pressure glow plasma method showed no differences in the chemical structures of plasma-polymerised films. © 1990 IOP Publishing Ltd.

引用

页码：374 / 377

页数：4

共 10 条

[1]

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[2]

AKABANE N, 1988, Patent No. 202977

[3]

AKABANE N, 1988, Patent No. 166599

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