SENSITIZER AGING EFFECTS ON METALIZATION AND IMAGING IN PHOTOSELECTIVE METAL DEPOSITION (PSMD) PROCESS

被引：7

作者：

DAMICO, JF ^{[1
]}

DEANGELO, MA ^{[1
]}

机构：

[1] WESTERN ELECT CO,ENGN RES CTR,PRINCETON,NJ 08540

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 11期

关键词：

D O I：

10.1149/1.2403285

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1469 / 1475

页数：7

共 24 条

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[4] OPTICAL RESPONSE IN PHOTOSELECTIVE METAL DEPOSITION (PSMD) IMAGING SYSTEM [J].

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[6]

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[8] SOME ASPECTS OF CHEMISTRY OF TIN SENSITIZING SOLUTIONS [J].

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[9] SURFACE CHARACTERIZATION OF SENSITIZED AND ACTIVATED TEFLON [J].

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[10] CONTACT ANGLE MEASUREMENTS OF TIN SENSITIZING SOLUTIONS [J].

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