INVESTIGATION OF ION-BEAM-SPUTTERED NB-TI THIN-FILMS BY COMPLEMENTARY USE OF BACKSCATTERING AND NUCLEAR-REACTION MICROANALYSIS

被引：8

作者：

BOUCHIER, D ^{[1
]}

GAUTHERIN, G ^{[1
]}

AGIUS, B ^{[1
]}

RIGO, S ^{[1
]}

机构：

[1] UNIV PARIS 7,ECOLE NORMAL SUPER,PHYS SOLIDES GRP,F-75221 PARIS 05,FRANCE

来源：

JOURNAL OF APPLIED PHYSICS | 1978年 / 49卷 / 12期

关键词：

D O I：

10.1063/1.324555

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：5896 / 5902

页数：7

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