THE DIFFUSION OF SILICON IN GERMANIUM

[11] DIFFUSION OF GERMANIUM IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (03) : 1409 - 1410

[12] SELF DIFFUSION IN INTRINSIC SILICON [J]. PHYSICA STATUS SOLIDI, 1966, 15 (02): : K119 - &

[13] PETROV DA, 1957, VOPROSY MET FIZ POLU, P130

[14] APPLICATION OF LOOP ANNEALING TECHNIQUE TO SELF-DIFFUSION STUDIES IN SILICON [J]. JOURNAL OF MATERIALS SCIENCE, 1974, 9 (12) : 1987 - 1993

[15] SEEGER A, 1968, PHYS STAT SOLIDI, V29, P4551

[16] VALENTA MW, 1956, PHYS REV, V106, P73

[17] Widmer H., 1961, HELV PHYS ACTA, V34, P635

[11] DIFFUSION OF GERMANIUM IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (03) : 1409 - 1410

[12] SELF DIFFUSION IN INTRINSIC SILICON [J]. PHYSICA STATUS SOLIDI, 1966, 15 (02): : K119 - &

[13] PETROV DA, 1957, VOPROSY MET FIZ POLU, P130

[14] APPLICATION OF LOOP ANNEALING TECHNIQUE TO SELF-DIFFUSION STUDIES IN SILICON [J]. JOURNAL OF MATERIALS SCIENCE, 1974, 9 (12) : 1987 - 1993

[15] SEEGER A, 1968, PHYS STAT SOLIDI, V29, P4551

[16] VALENTA MW, 1956, PHYS REV, V106, P73

[17] Widmer H., 1961, HELV PHYS ACTA, V34, P635