LARGE-SCALE 2-STEP SELECTIVE ALUMINUM CVD ON LASER PATTERNED PALLADIUM LINES

被引:17
作者
HABA, B
SUGAI, K
MORISHIGE, Y
KISHIDA, S
机构
[1] NEC Corporation, Opto-Electronics Research Laboratories, Miyamae-ku, Kawasaki, Kanagawa, 216
关键词
Acetone - Adhesion - Aluminum - Characterization - Electric conductivity - Electric wiring - Electronics packaging - Materials testing - Palladium compounds - Silica - Substrates - Thin films;
D O I
10.1016/0169-4332(94)90440-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In the present report we first outline and characterize the details of uniform deposition of PdAc from an acetone solution on a large area. Then, we investigate the parameters that highly influence the thickness and quality of the laser direct-written palladium lines (spin coating speed among others). Currently, good quality and uniform patterning of laser written thin lines of Pd have been achieved on samples as large as 4 inches in diameter. The Pd lines are well resolved (minimum of 3 mum in width now) and exhibit fairly good resistivity around 30 muOMEGA . cm. They also showed good adhesion to the SiO2 substrate as they endure repeated Scotch tape adhesion tests. Moreover, the second step of highly selective Al-CVD has been investigated under various conditions and gave rise to resistivities of about 6.5 muOMEGA . cm and 3000 angstrom thickness for a 7 min deposition. This process stands out as very promising for packaging and high density interconnect technologies.
引用
收藏
页码:381 / 384
页数:4
相关论文
共 7 条
[1]   LASER DIRECT-WRITE METALLIZATION IN THIN PALLADIUM ACETATE FILMS [J].
GROSS, ME ;
APPELBAUM, A ;
GALLAGHER, PK .
JOURNAL OF APPLIED PHYSICS, 1987, 61 (04) :1628-1632
[2]  
HABA B, 1991, JPN SOC APPL PHYS, V2, P583
[3]  
HABA B, 1992, JPN SOC APPL PHYS, V2, P568
[4]   PATTERNED ALUMINUM GROWTH VIA EXCIMER LASER ACTIVATED METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].
HIGASHI, GS ;
FLEMING, CG .
APPLIED PHYSICS LETTERS, 1986, 48 (16) :1051-1053
[5]   HIGH-SPEED LASER DIRECT WRITING OF TUNGSTEN CONDUCTORS FROM W(CO)6 [J].
NAMBU, Y ;
MORISHIGE, Y ;
KISHIDA, S .
APPLIED PHYSICS LETTERS, 1990, 56 (25) :2581-2583
[6]  
SHINZAWA T, 1990, 1990 MAT RES SOC S P, P377
[7]   PATTERNED PHOTONUCLEATION OF CHEMICAL VAPOR-DEPOSITION OF AL BY UV-LASER PHOTODEPOSITION [J].
TSAO, JY ;
EHRLICH, DJ .
APPLIED PHYSICS LETTERS, 1984, 45 (06) :617-619