EXPERIMENTAL-STUDY OF VERY-HIGH-FREQUENCY PLASMAS IN H-2 BY SPATIOTEMPORALLY RESOLVED OPTICAL-EMISSION SPECTROSCOPY

被引:15
作者
KAKUTA, S
KITAJIMA, T
OKABE, Y
MAKABE, T
机构
[1] Department of Electrical Engineering, Keio University, Yokohama, 223
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7B期
关键词
VHF PLASMA; DRIVING FREQUENCY; SPATIOTEMPORAL OPTICAL EMISSION SPECTROSCOPY; NET EXCITATION RATE;
D O I
10.1143/JJAP.33.4335
中图分类号
O59 [应用物理学];
学科分类号
摘要
A very-high-frequency (VHF) plasma at 100 MHz is experimentally investigated in parallel-plate configuration in H-2 using spatiotemporal optical emission spectroscopy and current-voltage-power waveforms. The observed optical emission intensity and net excitation rate profiles have strong temporal and spatial variations. The VHF plasma is still capacitive, and is maintained by reflected electrons in the oscillating sheath next to the instantaneous cathode. The characteristics of VHF plasmas, that the excitation rate increases in proportion to the square of driving frequency, and that the minimum sustaining voltage and pressure decrease with increasing frequency, are experimentally confirmed at pressures, ranging from 0.01 to 2 Torr and at the frequency of 100 MHz.
引用
收藏
页码:4335 / 4339
页数:5
相关论文
共 20 条
[1]   MEASUREMENT OF H- DENSITY IN PLASMA BY PHOTODETACHMENT [J].
BACAL, M ;
HAMILTON, GW ;
BRUNETEAU, AM ;
DOUCET, HJ ;
TAILLET, J .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1979, 50 (06) :719-721
[2]  
Burshtein M. L., 1987, Optics and Spectroscopy, V62, P729
[3]   TIME-DEPENDENT EXCITATION IN HIGH-FREQUENCY AND LOW-FREQUENCY CHLORINE PLASMAS [J].
FLAMM, DL ;
DONNELLY, VM .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (04) :1052-1062
[4]   AN EXPERIMENTAL SYSTEM FOR SYMMETRICAL CAPACITIVE RF DISCHARGE STUDIES [J].
GODYAK, VA ;
PIEJAK, RB ;
ALEXANDROVICH, BM .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1990, 61 (09) :2401-2406
[5]   A LOW DAMAGE, LOW CONTAMINANT PLASMA PROCESSING SYSTEM UTILIZING ENERGY CLEAN TECHNOLOGY [J].
GOTO, HH ;
SASAKI, M ;
OHMI, T ;
SHIBATA, T ;
YAMAGAMI, A ;
OKAMURA, N ;
KAMIYA, O .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1991, 4 (02) :111-121
[6]   ION DYNAMICS OF RF PLASMAS AND PLASMA SHEATHS - A TIME-RESOLVED SPECTROSCOPIC STUDY [J].
GOTTSCHO, RA ;
BURTON, RH ;
FLAMM, DL ;
DONNELLY, VM ;
DAVIS, GP .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (07) :2707-2714
[7]   FREQUENCY-DEPENDENCE ON THE STRUCTURE OF RADIO-FREQUENCY GLOW-DISCHARGES IN AR [J].
KAKUTA, S ;
MAKABE, T ;
TOCHIKUBO, F .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (08) :4907-4914
[8]   INFLUENCE OF FREQUENCY, PRESSURE, AND MIXTURE RATIO OF ELECTRONEGATIVE GAS ON ELECTRICAL CHARACTERISTICS OF RF DISCHARGES IN N-2-SF-6 MIXTURES [J].
KAKUTA, S ;
PETROVIC, ZL ;
TOCHIKUBO, F ;
MAKABE, T .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (08) :4923-4931
[9]   A computational investigation of the RF plasma structures and their production efficiency in the frequency range from HF to VHF [J].
Kitamura, T. ;
Nakano, N. ;
Makabe, T. ;
Yamaguchi, Y. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (01) :40-45
[10]   LIFETIME MEASUREMENT OF D3-PI-U STATE OF HYDROGEN MOLECULE [J].
KIYOSHIMA, T .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1987, 56 (06) :1989-1995