ORIENTATION EFFECTS IN RESISTIVITY OF TA FILMS SPUTTERED IN OXYGEN

被引：13

作者：

WESTWOOD, WD

机构：

来源：

关键词：

D O I：

10.1063/1.1653392

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：264 / &

共 9 条

[1]

Berry R.W., 1968, THIN FILM TECHNOLOGY

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Campbell, D. S. .

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[5] THIN FILMS DEPOSITED BY BIAS SPUTTERING [J].

MAISSEL, LI ;

SCHAIBLE, PM .

[6]

Mills D. J, 1966, J CAN CERAM SOC, V35, P48

READ, MH ;

ALTMAN, C .

[8]

SCHWARTZ N, T NATIONAL VACUUM S, P325

[9]

WESTWOOD WD, TO BE PUBLISHED