STRUCTURAL AND CHEMICAL-STATE ANALYSIS OF THE HEAT-TREATED AU-GASB(110) INTERFACE BY MEANS OF ANGLE-RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY (ARXPS)

被引：23

作者：

KOSHIZAKI, N ^{[1
]}

KUDO, M ^{[1
]}

OWARI, M ^{[1
]}

NIHEI, Y ^{[1
]}

KAMADA, H ^{[1
]}

机构：

[1] UNIV TOKYO,FAC ENGN,DEPT IND CHEM,BUNKYO KU,TOKYO 113,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 07期

关键词：

D O I：

10.1143/JJAP.19.L349

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L349 / L352

页数：4

共 16 条

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