PROCESS CHARACTERIZATION AND MECHANISM FOR LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF A-SI-H FROM SIH4

被引：29

作者：

METZGER, D

HESCH, K

HESS, P

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 45卷 / 04期

关键词：

D O I：

10.1007/BF00617941

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：345 / 353

页数：9

共 31 条

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