PHOTOTHERMAL IONIZATION SPECTROSCOPY OF OXYGEN-RELATED SHALLOW DEFECTS IN CRYSTALLINE SILICON

被引：34

作者：

GRIFFIN, JA ^{[1
]}

HARTUNG, J ^{[1
]}

WEBER, J ^{[1
]}

NAVARRO, H ^{[1
]}

GENZEL, L ^{[1
]}

机构：

[1] UNIV AUTONOMA PUEBLA,DEPT FISICA ICUAP,PUEBLA 72570,PUEBLA,MEXICO

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1989年 / 48卷 / 01期

关键词：

D O I：

10.1007/BF00617762

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：41 / 47

页数：7

共 17 条

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