ROLE OF SUBSTRATE-TEMPERATURE IN MOLECULAR-BEAM EPITAXIAL-GROWTH OF HIGH-POWER GAAS/ALGAAS LASERS

被引:19
作者
IYER, SV [1 ]
MEIER, HP [1 ]
OVADIA, S [1 ]
PARKS, C [1 ]
ARENT, DJ [1 ]
WALTER, W [1 ]
机构
[1] IBM CORP,DIV RES,CH-8803 RUSCHLIKON,SWITZERLAND
关键词
D O I
10.1063/1.106620
中图分类号
O59 [应用物理学];
学科分类号
摘要
The growth of high-quality GaAs/AlGaAs graded-index separate-confinement heterostructure single-quantum-well diode lasers is shown to be critically dependent on growth temperature. The temperature-dependent nature of oxygen incorporation in the cladding and active regions and its effect on laser performance is investigated in detail. A model is presented that takes the incorporation, desorption, and accumulation of impurities in different regimes into account.
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页码:416 / 418
页数:3
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