RELIABLE SPIN-ON SOURCE FOR ACCEPTOR DIFFUSION INTO III/V-COMPOUND SEMICONDUCTORS

被引：14

作者：

FRANZ, G

AMANN, MC

机构：

来源：

关键词：

D O I：

10.1149/1.2097388

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2410 / 2413

页数：4

共 26 条

[1] HYDROLYSIS OF ETHYL SILICATE
AELION, R
LOEBEL, A
EIRICH, F
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1950, 72 (12) : 5705 - 5712
[2] IMPROVED SHALLOW P+ DIFFUSION INTO INGAASP BY A NEW SPIN-ON DIFFUSION SOURCE
AMANN, MC
FRANZ, G
[J]. JOURNAL OF APPLIED PHYSICS, 1987, 62 (04) : 1541 - 1543
[3] LOW-THRESHOLD INGAASP-INP METAL-CLAD RIDGE-WAVE-GUIDE (MCRW) LASERS FOR 1.3 MU-M WAVELENGTH
AMANN, MC
STEGMULLER, B
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (02): : 228 - 230
[4] AMANN MC, Patent No. 1785
[5] DIFFUSION IN III-V SEMICONDUCTORS FROM SPIN-ON FILM SOURCES
ARNOLD, N
SCHMITT, R
HEIME, K
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1984, 17 (03) : 443 - +
[6] PSG MASKS FOR DIFFUSIONS IN GALLIUM-ARSENIDE
BALIGA, BJ
GHANDHI, SK
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (06) : 761 - &
[7] Bradley D.C., 1960, PROGR INORG CHEM, V2, P303, DOI DOI 10.1002/9780470166031.CH7
[8] BRADLEY DC, 1973, COMPREHENSIVE INORGA, V3, P468
[9] CASEY HC, 1968, T METALL SOC AIME, V242, P406
[10] CRYSTALLINE HYDROUS ZIRCONIA
CLEARFIELD, A
[J]. INORGANIC CHEMISTRY, 1964, 3 (01) : 146 - &