REQUIRED DONOR CONCENTRATION OF EPITAXIAL LAYERS FOR EFFICIENT INGAASP AVALANCHE PHOTO-DIODES

被引:65
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TAKANASHI, Y
KAWASHIMA, M
HORIKOSHI, Y
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10.1143/JJAP.19.693
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O59 [应用物理学];
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页码:693 / 701
页数:9
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共 23 条
[1]  
BACKMANN KJ, 1978, APPL PHYS LETT, V32, P466
[2]   INTERNAL FIELD EMISSION IN SILICON P-N JUNCTIONS [J].
CHYNOWETH, AG ;
MCKAY, KG .
PHYSICAL REVIEW, 1957, 106 (03) :418-426
[3]   BE-IMPLANTED 1.3-MUM INGAASP AVALANCHE PHOTODETECTORS [J].
FENG, M ;
OBERSTAR, JD ;
WINDHORN, TH ;
COOK, LW ;
STILLMAN, GE ;
STREETMAN, BG .
APPLIED PHYSICS LETTERS, 1979, 34 (09) :591-593
[4]   K-].P-] PERTURBATION-THEORY IN III-V COMPOUNDS AND ALLOYS - RE-EXAMINATION [J].
HERMANN, C ;
WEISBUCH, C .
PHYSICAL REVIEW B, 1977, 15 (02) :823-833
[5]   GAINASP-INP AVALANCHE PHOTO-DIODES [J].
HURWITZ, CE ;
HSIEH, JJ .
APPLIED PHYSICS LETTERS, 1978, 32 (08) :487-489
[6]   THEORY OF TUNNELING [J].
KANE, EO .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (01) :83-+
[7]  
KRESSEL H, 1962, P IRE, V50, P2493
[8]   ION-IMPLANTED INGAASP AVALANCHE PHOTO-DIODE [J].
LAW, HD ;
TOMASETTA, LR ;
NAKANO, K .
APPLIED PHYSICS LETTERS, 1978, 33 (11) :920-922
[9]   AVALANCHE BREAKDOWN IN SILICON [J].
MCKAY, KG .
PHYSICAL REVIEW, 1954, 94 (04) :877-884
[10]  
MIGITAKA M, 1962, J I ELECTR ENG JPN, V82, P26