ION-IMPLANTATION AND SPUTTERING IN THE PRESENCE OF REACTIVE GASES - BOMBARDMENT-INDUCED INCORPORATION OF OXYGEN AND RELATED PHENOMENA

被引：45

作者：

WACH, W

WITTMAACK, K

机构：

来源：

关键词：

D O I：

10.1063/1.329156

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3341 / 3352

页数：12

共 47 条

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[8] ANOMALOUSLY HIGH COLLECTION OF COPPER IONS IMPLANTED IN ALUMINIUM
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[9] Biersack J. P., 1973, Radiation Effects, V19, P249, DOI 10.1080/00337577308232256
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