ANNEAL BEHAVIOR OF ALUMINUM-IMPLANTED GERMANIUM

被引：7

作者：

ITOH, T

OHDOMARI, I

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1971年 / 10卷 / 08期

关键词：

D O I：

10.1143/JJAP.10.1002

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1002 / &

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