X-PINCH SOFT-X-RAY SOURCE FOR MICROLITHOGRAPHY

被引：35

作者：

HAMMER, DA ^{[1
]}

KALANTAR, DH ^{[1
]}

MITTAL, KC ^{[1
]}

QI, N ^{[1
]}

机构：

[1] BHABHA ATOM RES CTR,DIV PLASMA PHYS,BOMBAY 400085,INDIA

来源：

APPLIED PHYSICS LETTERS | 1990年 / 57卷 / 20期

关键词：

D O I：

10.1063/1.103948

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A novel soft x-ray source for submicron resolution lithography is described. Exploratory experiments with the x-pinch dense plasma radiation source have been performed using a 500 kA, 40 ns pulsed power generator. About 33 J of magnesium K-shell radiation (1.3-1.5 keV) and 10 J of aluminum K-shell radiation (1.6-1.7 keV) have been produced in a source approximately 0.5 mm or less in diameter during a single pulse. The yield increased rapidly with current, implying the possibility of exposing a resist at a distance of 40 cm using a<750 kA pulser in as few as ten pulses.

引用

页码：2083 / 2085

页数：3

共 15 条

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