PROPOSAL FOR DEVICE TRANSPLANTATION USING A FOCUSED ION-BEAM

被引：15

作者：

OHNISHI, T

KAWANAMI, Y

ISHITANI, T

机构：

[1] Central Research Laboratory, Hitachi Ltd, Tokyo

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1990年 / 29卷 / 01期

关键词：

Deposition; Device transplantation; Focused ion beam; Microdevice; Sputtering;

D O I：

10.1143/JJAP.29.L188

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Device transplantation using a focused ion beam (FIB) has been proposed as a new high-resolution technique for microdevice assembly as well as device repair. FIB sputtering, redeposition, and FIB-induced deposition each work as a cutter or a fixer. Feasibility experiments have been carried out both for dummy-device transplantation on a silicon substrate and for microgear fabrication. © 1990 IOP Publishing Ltd.

引用

页码：L188 / L190

页数：3

共 19 条

[1] Benning G., 1987, REV MOD PHYS, V59, P615
[2] SUPPLEMENTAL MULTILEVEL INTERCONNECTS BY LASER DIRECT WRITING - APPLICATION TO GAAS DIGITAL INTEGRATED-CIRCUITS
BLACK, JG
DORAN, SP
ROTHSCHILD, M
EHRLICH, DJ
[J]. APPLIED PHYSICS LETTERS, 1987, 50 (15) : 1016 - 1018
[3] SCANNING ION-BEAM TECHNIQUES FOR THE EXAMINATION OF MICROELECTRONIC DEVICES
CLEAVER, JRA
KIRK, ECG
YOUNG, RJ
AHMED, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03): : 1026 - 1029
[4] ION-BEAM-INDUCED DEPOSITION OF GOLD BY FOCUSED AND BROAD-BEAM SOURCES
DUBNER, AD
SHEDD, GM
LEZEC, H
MELNGAILIS, J
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (05): : 1434 - 1435
[5] INTEGRATED-CIRCUIT REPAIR USING FOCUSED ION-BEAM MILLING
HARRIOTT, LR
WAGNER, A
FRITZ, F
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 181 - 184
[6] SURFACE MICROMACHINING FOR MICROSENSORS AND MICROACTUATORS
HOWE, RT
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 1809 - 1813
[7] SIMPLE CALCULATION ON TOPOGRAPHY OF FOCUSED-ION-BEAM SPUTTERED SURFACE
ISHITANI, T
OHNISHI, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (02): : L320 - L322
[8] FILM GROWTH AND MECHANISM OF LICVD OF CHROMIUM FILMS FROM CR(CO)6 AT 248 NM
KONSTANTINOV, L
NOWAK, R
HESS, P
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 47 (02): : 171 - 181
[9] HIGH-RESOLUTION ELECTRON-BEAM INDUCED DEPOSITION
KOOPS, HWP
WEIEL, R
KERN, DP
BAUM, TH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 477 - 481
[10] MADOKORO Y, 1989, 20TH S ION IMPL SUBM, P133

← 1 2 →